Fluoroform: Chemical compound, Trihalomethane, Halogen, Teflon, Decarboxylation, Trifluoroacetic acid, Maurice Meslans, Otto Ruff, Plasma etching

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Fluoroform: Chemical compound, Trihalomethane, Halogen, Teflon, Decarboxylation, Trifluoroacetic acid, Maurice Meslans, Otto Ruff, Plasma etching

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Fluoroform: Chemical compound, Trihalomethane, Halogen, Teflon, Decarboxylation, Trifluoroacetic acid, Maurice Meslans, Otto Ruff, Plasma etching

Spécifications du produit

Marque OmniScriptum
EAN
  • 9786132693877

OmniScriptum

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Halide: Binary compound, Halogen, Atom, Chemical element, Electronegativity, Alkali metal, Astatine, Salinity,...

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Dry etching: Semiconductor, Fluorocarbon, Boron trichloride, Isotropic etching, Photolithography, Semiconductor device, Plasma...

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